Dynamic Temperature Control System
Various types of chillers are available to meet your efficiency and goals
Customized Chiller Heater Combo
We have many models: SUNDI series, WTD series, HR series, etc. The temperature control accuracy of the product can reach ±0.1°C, and corresponding products can be provided from 0.5kW to 1200kW in refrigeration power.
Advantage
- Cooling power 0.5kW~1200kW
- Heating power 2kW~200kW
- High-precision, intelligent temperature control
- Multifunctional alarm system and safety features
- 7-inch, 10-inch color TFT touch screen graphic display
- With magnetic drive pump, there is no shaft seal leakage problem
- High-temperature cooling technology, which can directly cool down from 300°C
- Efficient production stability and reproducible results
- Fully enclosed system, no need to replace the liquid medium
(SUNDI series)
Temperature Control Range: -120°C to +350°C
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SUNDI -80℃~250℃
Heating Power 3kW~80kW Cooling capacity 0.3kW~80kW Power range 7.5kW~150kW
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SUNDI -60℃~250℃
Cooling capacity 0.25kW~60kW Heating Power 2.5kW~60kW Power range 5kW~95kW
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SUNDI -25℃~200℃
Cooling capacity 1kW~200kW Heating Power 2.5kW~200kW Power range 4kW~260kW
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SUNDI -90℃~250℃
Heating Power 3kW~80kW Cooling capacity 0.3kW~80kW Power range 7.5kW~150kW
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SUNDI -70℃~250℃
Cooling capacity 0.4kW~15kW Heating Power 2.5kW~15kW Power range 5.2kW~28kW
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SUNDI -45℃~250℃
Heating Power 3.5kW~200kW Cooling capacity 0.45kW~200kW Power range 6.5kW~280kW
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SUNDI -10℃~150℃
Cooling capacity 1.5kW~15kW Heating Power 2.5kW~15kW Power range 3.6kW~20kW
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SUNDI -100℃~135℃
Heating Power 3.5kW~80kW Cooling capacity 0.45kW~80kW Power range 12kW~200kW
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(WTD series)
Temperature Control Range: -70°C to +300°C
(Micro channel / tube reactors specialized)
Specialized design for micro channel (small liquid holding capacity, strong heat exchange capacity, circulation system high pressure drop)
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WTD -20℃~300℃
Heating Power 38kW~50kW Cooling capacity 12kW~50kW
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Cooling Heating Circulators
Temperature Control Range: -45°C to +250°C
(Only controlling oil temperature without controlling material temperature)
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HRT -45℃~250℃
Heating Power 2.5kW~15kW Cooling capacity 0.25kW~15kW Power range 4.5kW~25kW
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HR-25℃~200℃
Heating Power 2.5kW~15kW Cooling capacity 1kW~15kW Power range 4kW~21kW
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TCU Temperature Control Units
(Pharmaceutical and Chemical workshop production level)
Temperature control range: -120°C to +250°C
Application: chemical, pharmaceutical, petrochemical, biological and other industries, large-scale production-level temperature control requirements, such as various reactors, distillers, extraction systems, fermentation tanks, etc. for Chinese-style workshops and pharmaceutical and chemical plant production.
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ZLF -45℃~250℃
Heating Power 25kW~80kW Power range 2.3kW~10.5kW Material accuracy ±1℃
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SR -120℃~250℃
Heating Power 25kW~80kW Power range 2.3kW~10.5kW Material accuracy ±1℃
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TCU installation site for integrated temperature control equipment of reaction kettle system in pharmaceutical enterprises
ARE YOU LOOING FOR CHILLER HEATER COMBO?
Self-created model-free algorithms for temperature control.
Not all chiller heaters are created equal. Come see why!
Submit your product intentions and requirements, and we will contact you as soon as possible.
Principle
A specially designed lag estimator (model-free self-building tree algorithm) generates a dynamic signal yc(t) instead of the process variable y(t) as a feedback signal. Generate an e(t) signal to the controller, so that the controller does not have a large hysteresis in predicting the control effect, so that the controller can always generate an appropriate control signal. That is to say, this dynamic signal yc(t) can keep the feedback loop working normally even if there is a large lag.
Applications
- Dynamic temperature control of high pressure reactor
- Dynamic temperature control of double-layer glass reactor
- Dynamic temperature control of double-layer reactor
- Microchannel Reactor Temperature Control
- Distillation system temperature control
- Material aging test at low temperature and high temperature
- Combinatorial chemical constant temperature control
- Semiconductor equipment cooling and heating
- Vacuum chamber cooling and heating control
Applications
Reaction kettle | Fermentation tank | Microreactor | Tubular reactor |
Vacuum chamber | Freeze-drying machine | Multiphase reactor | Tower reactor |
Industrial oil treatment | Gas chromatograph | Rotary evaporator | Pilot plant |
Injection water system | Pharmaceutical water system | Neutralization reaction | decomposition reaction |
oxidation reaction | Polymerization reaction | Crystallization reaction | Fermentation reaction |
Oil decomposition | Concentration reaction | Extraction System | Test Bench |
Gas Condensation | Semiconductor Testing equipment | Fab equipment | AOI system CMOS/CCD |
Tool machine | Cooling tower | Battery test cooling | Laboratogy research |
Customized Chiller Heater
( supports both indoor and outdoor options.)
LNEYA’s industrial chiller cooling equipment is sold globally. Singapore, Malaysia, Japan, South Korea, various European countries such as Germany, Netherlands, UK, and United States, India.
Chillers (Biochemistry Pharmaceutical Process)
Temperature Control :-120℃~350℃
Temperature control for high pressure reactor;Double-layer glass reactor;Double-layer reactor;Microchannel Reactor;Distillation system;Material aging test;Vacuum chamber etc.
Control Temperature Control Flow Systems(Vehicle/Battery Pack Test)
Temperature Control: -40℃~100℃
Temperature simulation for vehicle quality test: battery life test, fuel injector/motor test bench, airbag test, component test bench, etc. It can simulate the external environmental conditions in the climate chamber or replace the internal system, which can create the necessary actual temperature conditions for the test bench.
Cooling Heating Systems (Wafer Production Semiconductor Test)
Temperature Control: -85℃~250℃
Suitable for semiconductor process wet washing, photolithography, etching, chemical meteorological deposition, physical meteorological deposition, and the electronics industry (photolithography process)